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在长时间连续加工情况下,即使稳定控制工艺参数,磁流变抛光材料去除效率仍会出现下降.通过仿真认为,去除效率的下降对于大口径工件的高精度修形而言不可忽略.通过材料去除机理分析、磁流变液微粒观测以及X射线衍射测试,认为去除函数发生变化是磁流变液中抛光颗粒消耗所致.基于液体抛光效率随抛光颗粒浓度增大而趋于饱和的规律,提出了定时定量添加过饱和磁流变抛光液使去除函数得到稳定控制的方法.通过实验,去除函数体积去除效率在达到饱和后波动率小于1!.最后对大口径光学元件进行修形,验证了控制方法的有效性.
In the case of continuous processing for a long time, even though the process parameters are controlled stably, the removal efficiency of MRF material will still decrease.It can be concluded through simulation that the removal efficiency can not be neglected for the high-precision modification of large-diameter workpieces, Removal mechanism analysis, magnetorheological fluid particle observation and X-ray diffraction test, it is considered that the removal function is changed due to the consumption of polishing particles in the MR fluid.According to the law of the liquid polishing efficiency becoming saturated with the increase of the polishing particle concentration, A method of timing quantitatively adding supersaturated magnetorheological fluid to stabilize the removal function is proposed.After experiment, the volumetric removal efficiency of the removal function is less than 1% after the saturation is reached.Finally, the large diameter optical element is modified and verified The effectiveness of control methods.