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本文用部分相干光成像理论研究了提高分辨力及增大焦深的原理．建立了二元光栅倾斜照明成像数理模型。对几种倾斜照明方式进行了模拟计算．对模拟结果作了分析比较。结果表明，用二元光栅照明较好，既能较大程度提高投影光刻曝光系统的分辨力及焦深，又能克服其他照明方式的能量利用率低等缺点。
In this paper, the theory of partially coherent light imaging is used to study the principle of increasing the resolution and increasing the depth of focus. Binary grating oblique illumination imaging mathematical model was established. Several inclined illumination methods were simulated. The simulation results are analyzed and compared. The results show that the binary grating illumination is better, which not only can greatly improve the resolving power and depth of focus of projection lithography exposure system, but also overcome the disadvantages of low energy efficiency of other illumination modes.