【摘 要】
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Homogeneous, crack-free SrNbxTi1-xO3 thin films on (110) silicon substrates were successfully fabricated by sol-gel processing. The optimum route and conditions
【机 构】
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Applied Chemicals Department
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Homogeneous, crack-free SrNbxTi1-xO3 thin films on (110) silicon substrates were successfully fabricated by sol-gel processing. The optimum route and conditions were systematically investigated. Sr(OAc)2 glacial acetic acid solution, after being refluxed and reacted with tartrate, formed Sr(OAc)2(C4H6O6)2; Ti(OBu)4 formed Ti(OAc)4-x(AcAc)x after having the ligand partially exchanged with AcAc, while Nb(OC2H5)5 formed (OAc)2Nb(AcAc)(C4H6O6) by exchanging of ligand in glacial acetic acid with (CH3CO)2O. All the metal species after undergoing partial hydrolysis and polymerization with hydroxyl or oxygen,formed SrNbxTi1-xO3 cluster sol. Methyl cellulose (MCL) caused SrNbxTi1-xO3 sol to have polymeric structure and easily form films. SrNbxTi1-xO3 films with perovskite were subsequently formed after being annealed at 650～750 ℃ for 60 min in 25% N2+75% H2 (volume ratio) atmosphere. Resistivity of the SrNb0.1Ti0.9O3 films at room temperature was 64μΩ.cm, a particular T2 temperature dependence of the resistivity, from 25 K up to room temperature, was observed.
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