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高分子材料,如甲基丙烯酸甲酯(polymethyl methacrylate,PMMA),由于其价格相对低廉和容易加工,在集成电路和MEMS研究中受到广泛的关注.本文提出了一种基于PMMA基板的多层同步辐射光刻技术,用于制作微驱动器等有移动部件的设备.设计的多层结构包括140个单元的叉指平行电容器,每个电容器的间隔是2,μm,最小尺寸是4,μm,厚度是200,μm,故深宽比达到50∶1.该制造方法具有高深宽比、高产出率及成本低等优点.
Polymer materials, such as polymethyl methacrylate (PMMA), have attracted extensive attention in the field of integrated circuits and MEMS because of their relatively low cost and easy processing.In this paper, a multi-layer based on PMMA substrate synchronization Radiation lithography for the fabrication of moving parts such as microdrivers, etc. The multilayer design consists of 140 cells of interdigitated parallel capacitors each spaced 2 μm apart, with a minimum size of 4 μm and a thickness of Is 200, μm, so the aspect ratio reaches 50: 1. This manufacturing method has the advantages of high aspect ratio, high yield and low cost.