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The TiB2 thin films were deposited on steel substrates using RF magnetron sputtering technique with the low normalized substrate temperature (0.1
Structure and Properties of TiB2 Thin Films Deposited at Low Temperatures Using RF Magnetron Sputter
【摘 要】
：
The TiB2 thin films were deposited on steel substrates using RF magnetron sputtering technique with the low normalized substrate temperature (0.1
【机 构】
：
State Key Lab of Material Processing and Die & Mould Technology,State Key Laboratory Breeding Base o
【出 处】
：
武汉理工大学学报（材料科学版）（英文版）
【发表日期】
：
2004年期
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