预期一种新紫外技术将降低制造半导体的成本,这样可制造出更小、更快的芯片。一组国际研究人员最近获得了该技术的专利。他们说这将影响半导体工业——可能是紫外光最大的商业应用——以及其它由紫外光通过光化学方式改变材料领域的主要进展。新紫外光产生技术直接应用于半导体生产,Murnick 与德国慕尼黑技术大学的研究人员研究这种方法,该技术使用一个比大气紫外光短或者是“深紫外”的波长。有不同的方法检查正在进行的工作、清除纳米尺度的杂质和粉尘。这是下一代器件需 It is expected that a new UV technology will reduce the cost of manufacturing semiconductors so that smaller and faster chips can be made. A group of international researchers recently won the patent for the technology. They say this will affect the semiconductor industry - probably the largest commercial use of UV light - and other major advances in the field of photochemically changing materials by UV light. The new UV light generation technology is applied directly to semiconductor manufacturing, and Murnick and the researchers at the Technical University of Munich in Germany studied the method, which uses a wavelength shorter than atmospheric UV light or “deep UV”. There are different ways to check on-going work to remove nano-scale impurities and dust. This is the next generation device needs