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利用微弧氧化方法在硅酸盐溶液中在Ti6Al4V合金表面生长出一层厚度达50μm的陶瓷氧化膜,并用X射线衍射(XRD)、扫描电镜(SEM)初步研究了氧化膜的组织结构。该氧化膜由大量金红石型TiO2和SiO2非晶相及少量锐钛矿型TiO2相组成,且膜内层金红石含量比膜外层高。这些相都是由微弧区熔融物快速冷却形成的。硅元素已扩散到膜内层,Ti、Si元素在膜内部分布是不均匀的。
A ceramic oxide film with a thickness of 50μm was grown on the surface of Ti6Al4V alloy in the silicate solution by micro-arc oxidation. The structure of the oxide film was studied by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The oxide film consists of a large number of rutile TiO2 and amorphous SiO2 phase and a small amount of anatase TiO2 phase, and the film inner rutile content higher than the outer layer. These phases are formed by the rapid cooling of the micro-arc zone melt. Silicon has been diffused into the inner membrane, Ti, Si elements within the membrane distribution is not uniform.