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采用反应磁控溅射法在不同的氮分压下制备了一系列CrNx 薄膜 ,并利用EDS和XRD表征了薄膜的成分和相组成 ,采用力学探针测量了薄膜的硬度和弹性模量。研究了氮分压对薄膜成分、相组成和力学性能的影响。结果表明 ,随氮分压的升高 ,薄膜的沉积速率明显降低 ;薄膜中的氮含量增加 ,相应地 ,相组成从Cr +Cr2 N过渡到单相Cr2 N ,再逐步经Cr2 N +CrN过渡到单相CrN ,并在Cr :N原子比为 1∶2和 1∶1时 ,薄膜的硬度出现极值 (HV2 7.1GPa和HV2 6.8GPa) ,而薄膜的弹性模量则在Cr2 N时呈现 3 5 0GPa的最高值。
A series of CrNx films were prepared by reactive magnetron sputtering at different nitrogen partial pressures. The films were characterized by EDS and XRD. The hardness and elastic modulus of the films were measured by mechanical probes. The effects of nitrogen partial pressure on the composition, phase composition and mechanical properties of the films were investigated. The results show that with the increase of nitrogen partial pressure, the deposition rate of the film decreases obviously. The nitrogen content in the film increases. Correspondingly, the phase composition changes from Cr + Cr2 N to single phase Cr2 N and then gradually passes through Cr2 N + CrN To single-phase CrN, and the hardness of the films showed the extreme values (HV2 7.1 GPa and HV2 6.8 GPa) when the atomic ratio of Cr: N was 1: 2 and 1: 1, while the elastic modulus of the films appeared at Cr2N The highest value of 35GPa.