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探讨了淀积时间、衬底温度、多源蒸发以及蒸发速度等因素对真空淀积膜厚度分布的影响。发现对各种淀积膜均存在一定的临界厚度,当膜厚小于它时,淀积系数即为厚度的函数;讨论了等黑度膜淀积时间与衬底温度的关系;双源淀积膜厚度分布的测量结果表明,只要膜厚度远大于临界厚度时,则实际测量值与迭加两单源分布曲线之计算值间的差值不大于5%;对蒸发速度影响的研究指出,在计算非定成分样品浓度时,必须考虑到不同蒸发速度的影响。
The effects of deposition time, substrate temperature, multi-source evaporation and evaporation rate on the thickness distribution of vacuum deposited films were discussed. It is found that there exists a certain critical thickness for all kinds of deposited films. When the film thickness is smaller than that, the deposition coefficient is a function of the thickness. The relationship between the deposition time of the black films and the substrate temperature is discussed. The measurement results of the film thickness distribution show that the difference between the actual measured value and the calculated value of the superimposed two single-source distribution curve is not more than 5% as long as the film thickness is much larger than the critical thickness. Studies on the influence of evaporation speed indicate that at When calculating concentrations of non-stationary components, the effect of different evaporation rates must be considered.