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日本ＰＩ技术研究所成功地开发出印刷涂布的感光性聚酰亚铵。此感光材料应用到集成电路光刻工艺 ,可达到 2 μｍ微米的光刻精度。在印刷电路板上光刻工艺精度达到2 0 μｍ。新型感光性聚酰亚铵材料在碱性溶液中易溶解 ,适合于多层高精度光刻工艺。印刷涂布的感光性聚酰亚铵
Japan PI Institute of Technology successfully developed a printing coated photosensitive polyimide. This photosensitive material is applied to the lithography of integrated circuits to achieve a lithography accuracy of 2 μm. Photolithographic process on printed circuit board achieves 20 μm accuracy. The new photosensitive polyimide material easily soluble in alkaline solution, suitable for multi-layer high-precision lithography process. Printed coated photosensitive polyimide