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根据薄膜沉积过程等离子体对光学薄膜膜料蒸气分子或原子的作用，建立了低压等离子体离子镀设备，并对常规光学薄膜，如硫化物、氧化物薄膜以及多层膜器件进行了系统的研究，对所制备薄膜样品的透射光谱、吸收、散射以及膜层的聚集密度等进行了全面的测试分析。实验研究表明，低压等离子体离子镇可大大提高常规光学薄膜的光机性能。
According to the effect of plasma on vapor molecules or atoms in optical thin films, the low pressure plasma ion plating equipment was established and the conventional optical thin films such as sulfide, oxide films and multilayer films were systematically studied , The prepared thin film samples of the transmission spectrum, absorption, scattering and the film density and so on a comprehensive analysis of the test. Experimental studies have shown that low-pressure plasma ionization can greatly improve the optical performance of conventional optical films.