Progress in material removal mechanisms of surface polishing with ultra precision

来源 :中国科学通报：英文版 | 被引量 : 0次 | 上传用户：Kimyueyue

【摘要】

：

Chemical mechanical polishing (CMP) process is commonly regarded as the best method for achieving global planarization in the field of surface finishing with ul

【作者】

：

XUJin LUOJianbin LUXinchun ZHA

【机构】

：

StateKeyLaboratoryofTribo

【出处】

：

中国科学通报：英文版

【发表日期】

：

2004年16期

【关键词】

：

化学机械抛光 CMP 物质迁移机理磨损 ULSL 计算机硬盘 CMP material removal mechanism wear ULSI com

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Chemical mechanical polishing (CMP) process is commonly regarded as the best method for achieving global planarization in the field of surface finishing with ultra-precision. The development of investigation on material removal mechanisms for different ma

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Progress in material removal mechanisms of surface polishing with ultra precision

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