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报道了我们制作深亚微米 x射线掩模的工艺和同步辐射 x射线曝光工艺 ,并报道了我们在北京同步辐射装置 (BSRF) 3B1 A光刻束线所获得的深亚微米 x射线光刻图形的实验结果
We reported the process of making deep sub-micron x-ray masks and the synchrotron radiation x-ray exposure process, and reported the deep sub-micron x-ray lithography patterns we obtained at Beijing Synchrotron Radiation Facility (BSRF) The experimental results