论文部分内容阅读
本文利用脉冲电沉积的方法制备氧化镍电色材料并研究了沉积条件对其反应速度的影响。发现在较大的脉冲电源开关比及适当的反向刻蚀电压下沉积的样品具有较快的反应速度。在此条件下反应速度的改进是由于材料内部含有较小的晶粒及较多的非晶组织,因而便于着色离子在其中的运动。实验中还发现脉冲电沉积的样品与直流电沉积的样品相比,具有较好的开路稳定性。
In this paper, pulsed electrodeposition was used to prepare nickel oxide electrochromic materials and the effect of deposition conditions on the reaction rate was studied. It was found that samples deposited at larger pulse power switch ratios and appropriate reverse etching voltage had a faster response rate. Under these conditions, the improvement of the reaction speed is due to the material containing smaller grains and more amorphous structure, thus facilitating the movement of colored ions in it. Experiments also found that the pulse electrodeposited samples had better open circuit stability than the DC deposited samples.