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对磁流变抛光进行高精度光学表面加工中必须考虑和控制的7类参数,即磁流变液黏度、磁场强度、磁流变液流量、抛光轮转速、锻带厚度、切深以及抛光斑点特性进行分析和优化,得出单因素条件下材料的去除量总是同这7类参数的变化存在一定的内在联系.在分析和优化磁流变抛光过程中这些参数的基础上,采用自研的KDMRF-1000机床对一块K4材料口径100,mm的平面镜进行了抛光加工实验.经过两次循环大约200min的抛光后,面形误差值由最初的峰谷值(PV)为262,nm,均方根值(RMS)为49,nm收敛到最终的PV为55,nm,RMS为5.7,nm.实验中面形误差的收敛表明:只要掌握了磁流变抛光过程中的这7种参数的变化规律,就能充分利用磁流变抛光技术,为高精度光学表面的加工提供可靠的保障.
7 types of MRF parameters that must be considered and controlled in MR surface processing, ie MR fluid viscosity, magnetic field strength, MR flow rate, rotation speed of polishing wheel, thickness of forging belt, depth of cut, and polishing spots Characteristics of the material are analyzed and optimized, it is concluded that the removal of material under the single factor always has an inherent relationship with the change of these seven parameters.Based on the analysis and optimization of these parameters in the MRF process, KDMRF-1000 was used to polish a flat mirror with a diameter of 100mm and a K4 material.After two cycles of polishing for about 200min, the surface error was changed from the initial peak-valley value (PV) to 262 nm The root mean square (RMS) is 49, nm converges to a final PV of 55, nm, and the RMS is 5.7 nm. The convergence of the surface error in the experiment indicates that as long as one of the seven parameters in the MRF polishing process Changes in law, we can make full use of magnetic rheological polishing technology for the processing of high-precision optical surface to provide a reliable guarantee.