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在LCD生产中,从平板靶溅射ITO已是一项非常成熟的工艺,但如果转而采用旋转柱状靶,则可大大降低镀膜基板的成本。
In LCD production, sputtering ITO from a flat target is already a very mature process, but the cost of a coated substrate can be greatly reduced if rotary cylindrical targets are used instead.