利用金属有机气相沉积 (MOCVD)方法 ,在经过预沉积和表面研磨处理的Al2 O3 陶瓷基片上制备多晶钼膜 .通过该薄膜的表面形态及其结构的观察分析 ,讨论了该薄膜的形成机制 .结果表明 ,基片的表面形态是影响薄膜生长成核机理的重要因素 ,基底表面的状态设计是提高成核密度 ,获取优质薄膜的有效方法 The polycrystalline molybdenum film was prepared on the Al 2 O 3 ceramic substrate pre-deposited and surface-polished by metalorganic vapor deposition (MOCVD) method. The surface morphology and structure of the film were observed and analyzed, and the formation mechanism of the film was discussed The results show that the surface morphology of the substrate is an important factor affecting the nucleation mechanism of the film growth. The design of the substrate surface is an effective way to improve the nucleation density and obtain the high quality thin film