论文部分内容阅读
多层抗蚀剂工艺作为一门新技术,对于改进加工工艺并满足超大规模集成电路产品成品率要求,业已十分迅速地进入了成熟阶段。多层抗蚀剂成功地用于集成电路工艺,对于远紫外曝光技术的进一步改进和开发将是十分有益的。
As a new technology, the multi-layer resist process has entered a mature stage very rapidly for improving the processing technology and meeting the yield requirements of very large scale integrated circuit products. The successful use of multilayer resists in integrated circuit processes will be very beneficial for further improvements and developments in deep UV exposure technology.