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:本文介绍了一种与传统Cr掩模制作工艺相兼容的单层衰减相移掩模的结构、原理和制作方法 ,提供了部分实验结果。
This paper introduces the structure, principle and fabrication of a monolayer attenuated phase shift mask that is compatible with the conventional Cr mask fabrication process. Some experimental results are provided.