采用电子束蒸发方法在LiB3O5(LBO)晶体上制备了无缓冲层和具有不同缓冲层的1064nm,532nm倍频增透膜。利用Lambda900分光光度计、MTS Nano Indenter纳米力学综合测试系统以及调Q脉冲激光装置对样品的光学性能、附着力和激光损伤阈值进行了测试分析。结果表明,所有样品在1064nm和532nm波长的剩余反射率都分别小于0.1%和0.2%。与无缓冲层样品相比,预镀Al2O3缓冲层的样品的附着力提高了43%,具有Si O2缓冲层的样品的附着力显著提高。激光损伤阈值分析表明,采用Si O2缓冲层改进了薄膜的抗激光损伤性能,但是Al2O3缓冲层的插入却导致薄膜的激光损伤阈值降低。 A 1064nm, 532nm doubling antireflection coating without buffer layer and different buffer layer was prepared on LiB3O5 (LBO) by electron beam evaporation. The optical properties, adhesion and laser damage thresholds of the samples were tested by Lambda900 spectrophotometer, MTS Nano Indenter nanometer mechanics test system and Q-switched pulsed laser device. The results show that the residual reflectivities for all samples are less than 0.1% and 0.2% at 1064 nm and 532 nm, respectively. The adhesion of the sample pre-Al 2 O 3 buffer layer increased by 43% compared to that of the non-buffer layer sample, and the adhesion of the sample with Si O 2 buffer layer was significantly improved. Laser damage threshold analysis shows that the Si O2 buffer layer improves the anti-laser damage performance of the film, but the insertion of the Al2O3 buffer layer causes the laser damage threshold of the film to decrease.