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为了实现对极紫外光刻投影物镜非球面反射镜的超高精度检测,引入了可见光移相点衍射干涉仪,介绍了其工作原理,并采用自行设计的十三步移相算法和传统五步移相算法对可见光移相点衍射干涉仪的测试误差进行了详细的理论分析及仿真计算,分析结果证明了十三步算法优越性的同时,也给出了要实现干涉仪的超高检测精度应该限定的测试组件的性能参数。为了验证可见光移相点衍射干涉仪及十三步算法的切实可行性,搭建了原理实验装置,通过40次重复测量取平均值的方法获得被检元件面形。实验结果表明:十三步算法和五步算法的结果相近,但十三步算法的重复性优于五步算法。采用十三步算法,在所构建的实验装置上实现了RMS值优于λ/10 000(λ=632.8 nm)的检测重复性。
In order to realize ultrahigh-precision detection of EUV lithography objective aspheric mirror, a visible light phase shift diffraction interferometer is introduced, its working principle is introduced, and a 13-step phase-shifting algorithm designed by itself and a traditional five-step Phase shift algorithm of the visible phase shift point diffraction interferometer test error detailed theoretical analysis and simulation calculations, the results show that the advantages of the thirteen-step algorithm, but also gives the interferometer to achieve ultra-high detection accuracy The performance parameters of the test component should be limited. In order to verify the feasibility of the diffraction point interferometer with visible light and the thirteen-step algorithm, a principle experiment device was set up and the surface shape of the tested components was obtained by averaging 40 repeated measurements. The experimental results show that the results of the thirteen-step algorithm and the five-step algorithm are similar, but the repeatability of the thirteen-step algorithm is superior to the five-step algorithm. Using the thirteen-step algorithm, the detection repeatability with the RMS value better than λ / 10000 (λ = 632.8 nm) was achieved on the experimental setup.