掩模移动技术是一种通过移动掩模调制曝光量的连续面形微光学制作技术 ,其工作的局限性在于该技术对所制元件的对称性要求高 ,因此限制了制作复杂面形的功能。本文从分析掩模移动过程中的边框效应入手 ,阐明了消除这一效应负面影响的办法 ,并利用它来降低掩模移动技术的对称性要求 ,在实验中制作出了面形复杂的连续浮雕微光学元件。 Mask moving technology is a continuous surface shape micro-optical manufacturing technology that modulates the exposure amount by moving the mask. The limitation of the operation is that the technology requires high symmetry of the manufactured components, thus limiting the function of making complex surface shapes . This paper starts from the analysis of the border effect in the process of mask movement, clarifies the way to eliminate the negative effect of this effect, and uses it to reduce the symmetry requirements of the mask moving technology. In the experiment, Micro optical components.