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注入参量变化引起不同的混合结果,在宽温区中得到Ni_2Si、NiSi、NiSi_2多种化合物相,进而探讨了Xe离子诱导的Ni/Si体系界面原子混合机理及诱发相变的动力学过程。
Different mixing results are caused by the variation of the injection parameters. Ni2Si, NiSi and NiSi2 phases are obtained in the wide temperature range. Then the atomic mixing mechanism and the kinetic process of induced phase transformation induced by Xe ion are discussed.