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在基于光刻模型的光学邻近校正(MB-OPC)中,线段与控制点的映射关系是影响校正结果的一个重要因素。现有的线段与控制点的映射关系均是基于规则的,或者是精度较差的一对一映射关系,或者是计算速度较慢的全对一映射关系。提出了一种新的带有线段与控制点映射模型的光学邻近校正技术,其映射模型是根据光强梯度推导出的特征区域,线段与控制点的映射关系可以是一对一的,也可以是多对一的,且该映射关系在校正过程中对所有的控制点均适用,无需重复计算。实验结果表明,带有映射模型的MB-OPC结果的边放置误差(EPE)的方差改善显著,且运行时间无显著增加。
In the lithography-based optical proximity correction (MB-OPC), the mapping relationship between the line segment and the control point is an important factor that affects the calibration result. The existing mapping relationships between line segments and control points are all rule-based, either one-to-one mapping with poor accuracy or all-to-one mapping with slower computation speed. A new optical proximity correction technology with line segment and control point mapping model is proposed. The mapping model is a feature region derived from the light intensity gradient. The mapping relationship between line segments and control points can be one-to-one, Is many-to-one, and the mapping relationship applies to all control points in the calibration process without double counting. The experimental results show that the variance of edge placement errors (EPE) of MB-OPC results with the mapping model improves significantly and the running time does not increase significantly.