用扫描曝光法制作相息图与抽样曝光法相比具有可以连续取样和设备简单的优点。本文提出了一种扫描曝光的方案,其扫描mask的开孔长度不受成象系统的限制。它适用于可以进行变量分离的Kinoform型元件。 Compared with the sample exposure method, the phase contrast image produced by the scanning exposure method has the advantages of continuous sampling and simple equipment. In this paper, a scheme of scanning exposure is proposed, in which the length of the opening of the scanning mask is not limited by the imaging system. It is suitable for Kinoform type components that can be used for variable separation.