高频离子源中等离子体化学反应引出金属和卤素离子的实验中,存在一个规律性的东西。那就是,放电室内的气压在工作范围内变化时,离子束中金属离子和卤素离子的含量也都随之改变。当气压升高时,金属离子的百分比增大,卤素离子的百分比减小;反之,金属离子的比率下降,而卤素离子的比率上升。本文对这样一个事实进行了一些讨论。 High-frequency ion source plasma chemical reactions lead to metal and halide ions in the experiment, there is a regular thing. That is, when the pressure inside the discharge chamber changes within the working range, the contents of metal ions and halogen ions in the ion beam also change. As the pressure increases, the percentage of metal ions increases and the percentage of halogen ions decreases. Conversely, the ratio of metal ions decreases and the ratio of halogen ions increases. This article has some discussion of such a fact.