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采用Langmuir探针对两种不同非平衡度磁场环境中(K值分别为2.78和6.41)的溅射等离子体进行诊断,并使用高斯仪测量靶材表面的磁感应强度,结合靶材表面磁场分布的Ansys软件模拟,分析了等离子体在非平衡磁场环境中的运动规律。结果表明:磁控阴极内侧(靶材表面中部)的溅射等离子体主要参数(离子密度、电子密度及电子温度)在两种不同非平衡度磁场中都具有随靶基距增大而逐渐减小的趋势,大量带电粒子从磁控阴极外端向远离靶材表面的区域运动;K为2.78时的等离子体参数在靶材表面的刻蚀环正上方60 mm范围内明显高于K为6.41时,前者靶材表面的磁感应强度大于后者;向外发散的磁力线数量随K值的增大而增多。
The Langmuir probe was used to diagnose the sputtering plasma in two different non-equilibrium magnetic fields (K values are 2.78 and 6.41 respectively), and the magnetic induction intensity of the target surface was measured by Gauss instrument. The magnetic field distribution of the target surface Ansys software simulation, analysis of the plasma in the non-equilibrium magnetic field motion law. The results show that the main parameters (ion density, electron density and electron temperature) of the sputtered plasma on the inner side of the magnetron cathode (the middle of the target surface) are gradually reduced with the increase of the target distance in two different unbalanced magnetic fields A large amount of charged particles move from the outer end of the magnetron cathode away from the surface of the target. The plasma parameter with K of 2.78 is obviously higher than the K value of 6.41 , The magnetic induction intensity of the former target surface is greater than the latter; the number of outward divergent magnetic flux increases with the increase of K value.