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高功率脉冲磁控溅射是一种制备高质量薄膜的新兴方法。在相同的平均功率下分别采用HPPMS技术和传统DCMS技术在凹槽工件表面制备了钒薄膜。对比研究了两种方法下的等离子体组成、薄膜的晶体结构、表面形貌及膜层厚度的异同。结果表明:HPPMS产生的等离子体包括Ar(1+),V(0)和相当数量的V(1+);而DCMS放电时的等离子体包括Ar(1+),V(0)和极少量的V(1+)。两种方法制备的凹槽不同位置处钒薄膜相结构的变化规律大致相似。HPPMS制备的钒薄膜表面致密、平整;而DCMS制备的膜层表面出现非常锐利的尖峰且高度很高,凹槽不同位置表面状态表现出较大差异。DCMS制备的钒薄膜截面表现为疏松的柱状晶结构;而HPPMS制备的膜层也具有轻微的柱状晶结构,但结构更为致密。HPPMS时的膜层厚度小于DCMS时的膜层厚度。与凹槽工件的上表面相比,DCMS时侧壁膜层的厚度为上表面的32%,底部膜层的厚度为上表面的55%。而HPPMS时侧壁的厚度为上表面的35%,底部膜层的厚度为上表面的69%。采用HPPMS方法在凹槽工件表面获得的膜层厚度整体上表现出更好的均匀性。
High-power pulsed magnetron sputtering is a new method for producing high quality thin films. At the same average power, HPPMS technology and conventional DCMS technology were used to prepare vanadium films on the surface of grooved workpiece. The similarities and differences of the plasma composition, the crystal structure, the surface morphology and the film thickness of the two methods were compared. The results show that the plasma generated by HPPMS consists of Ar (1 +), V (0) and a considerable amount of V (1+) V (1+). Variations of vanadium films at different positions of the grooves prepared by the two methods are similar. The surface of vanadium thin films prepared by HPPMS is dense and flat. However, the surface of DCP films prepared by DCMS shows very sharp spikes and high heights, and the surface states of the grooves at different positions show great differences. The cross-section of vanadium film prepared by DCMS showed a loose columnar crystal structure, while the film prepared by HPPMS also had a slight columnar crystal structure, but the structure was denser. The film thickness at HPPMS is less than the film thickness at DCMS. The thickness of the sidewall film layer at DCMS was 32% of the upper surface and the thickness of the bottom film layer was 55% of the upper surface as compared to the upper surface of the recessed workpiece. The wall thickness of the HPPMS was 35% of the top surface and the thickness of the bottom layer was 69% of the top surface. The thickness of the film obtained on the surface of the grooved workpiece by the HPPMS method shows better overall uniformity.