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介绍了Mo2 C膜表面粗糙度的测量结果 ,引入晶粒边界修正 ,对Mo2 C膜的表面快速粗糙化现象给予理论解释 .
The measurement results of the surface roughness of Mo2 C film were introduced, and the grain boundary correction was introduced to give a theoretical explanation of the rapid surface roughening of Mo2 C film.