论文部分内容阅读
为了提高Ge基底的红外光能量的透过率和膜层的机械强度,对Ge基底上高性能的红外宽带减反射膜的设计与制备工艺进行了研究。介绍了红外宽带减反射膜的合理的膜料选择、膜系设计和优化方法以及采用离子束辅助沉积技术沉积该膜系的过程。给出了离子束辅助沉积技术各工艺参数,以及在最佳参数条件下制备的7.5～11.5μm波段宽带减反射膜单双面增透实测光谱曲线,其峰值透过率高达99.2%,在设计的波段范围内,平均透过率大于98%,膜层附着性能好,光机性能稳定,重复性好,能够通过GJB2485-95所规定的各项环境测试,并且光学性能没有明显的变化,这对于红外光学系统的应用具有十分重要的意义。
In order to improve the transmittance of infrared energy of Ge substrate and the mechanical strength of the film, the design and preparation technology of high performance infrared broadband antireflection film on Ge substrate were studied. The reasonable film selection, film design and optimization method of infrared wideband anti-reflection film and the deposition process of the film by ion beam assisted deposition technique are introduced. The technological parameters of ion beam assisted deposition technology and the measured single- and double-sided spectral transmittance curves of 7.5 ~ 11.5μm broadband broadband anti-reflection coatings prepared under the optimal parameters were obtained. The peak transmittance was as high as 99.2% Of the wavelength range, the average transmittance of more than 98%, film adhesion, optical performance and stability, repeatability, can pass GJB2485-95 prescribed environmental testing, and no significant changes in optical properties, which The application of infrared optical system is of great significance.