本文推导出了抗蚀剂的优值用以估计抗蚀剂组成与工艺条件的各种组合的相应分辨率。抗蚀剂在显影过程中的溶解速率与曝光能量的函数关系的测量。对计算抗蚀剂的优值提供了充足的数据。该方法易于在市售抗蚀剂的组成及其最佳工艺条件之间进行迅速的比较,也运用于电子束和 X—射线复印及负性抗蚀剂,当应用于负性抗蚀剂时,溶解速率的测量方法稍有不同。 The paper deduces the optimal value of the resist to estimate the corresponding resolution of the various combinations of resist composition and process conditions. Measurement of the dissolution rate of resist during development as a function of exposure energy. The calculation of the optimal value of the resist provides sufficient data. The method is easy to quickly compare between the composition of a commercially available resist and its optimum process conditions, as well as for electron beam and X-ray copying and negative resist, when applied to negative resist , The measurement of dissolution rate is slightly different.