通过对化学腐蚀法制备的单晶硅表面微结构进行分析,建立了一种金字塔微结构的数学模型,采用时域有限差分法(FDTD)数值计算了波长在300~1 000nm范围内微结构表面反射率随波长的变化规律,并将计算结果与实验测量结果进行了比较、分析和解释。在此基础上,针对不同实验条件下所形成的金字塔微结构差异,数值计算了几种不同参数金字塔结构表面的反射率随波长的变化规律。研究表明,反射率随金字塔的占空比和倾角的增大而减小,而金字塔尺寸变化对反射率的影响较小。当金字塔的结构参数为底边长2μm、占空比1、倾角约60°时减反效果较好,平均反射率仅为6.28%。 By analyzing the microstructure of monocrystalline silicon prepared by chemical etching, a pyramid microstructure mathematical model was established. The microstructural surface of the pyramid was calculated by the finite difference time domain (FDTD) Reflectance with wavelength variation law, and the calculation results and experimental measurement results were compared, analyzed and explained. On this basis, according to the microstructure difference of the pyramid formed under different experimental conditions, the variation law of the reflectivity of the pyramid structure surface with the wavelength of several different parameters was numerically calculated. The results show that the reflectivity decreases with the increase of the duty cycle and inclination of the pyramid, while the pyramid size has little effect on the reflectivity. When pyramid structure parameters for the base length of 2μm, duty cycle 1, tilt angle of about 60 ° better antireflective effect, the average reflectance of only 6.28%.