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提出了一种基于小波变换描述薄膜表面形貌的方法 .运用离散小波变换法研究磁控溅射Cu W薄膜表面特征随溅射时间的演变 .结果表明 ,Cu W薄膜在溅射时间超过 6 0 0s时才达到稳定 .不同薄膜表面形貌的变化主要是由高频部分引起 .薄膜的粗糙表面会引起纳米压入硬度值的分散 ,这种分散性可用基于小波变换的薄膜表面形貌多尺度分解评价 .
A method based on wavelet transform to describe the surface morphology of thin films was proposed.The surface features of CuW films deposited by magnetron sputtering were investigated by using discrete wavelet transform.The results show that when the sputtering time of CuW thin films exceeds 60 0s to stabilize.The changes of the surface morphology of different films are mainly caused by the high-frequency part.The rough surface of the film will cause the dispersion of the nanoindentation hardness value.The dispersion can be based on wavelet transform surface morphology of the multi-scale Decomposition evaluation.