【摘 要】
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The influence of dry etching damage on the inteal quantum efficiency of InGaN/GaN nanorod multiple quantum wells (MQWs) is studied.The samples were etched by in
【机 构】
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Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials and School of Electr
论文部分内容阅读
The influence of dry etching damage on the inteal quantum efficiency of InGaN/GaN nanorod multiple quantum wells (MQWs) is studied.The samples were etched by inductively coupled plasma (ICP) etching via a selfassembled nickel nanomask,and examined by room-temperature photoluminescence measurement.The key parameters in the etching process are rf power and ICP power.The inteal quantum efficiency of nanorod MQWs shows a 5.6 times decrease substantially with the rf power increasing from 3W to 100W.However,it is slightly influenced by the ICP power,which shows 30％ variation over a wide ICP power range between 30W and 600W.Under the optimized etching condition,the inteal quantum efficiency of nanorod MQWs can be 40％ that of the as-grown MQW sample,and the exteal quantum efficiency of nanorod MQWs can be about 4 times that of the as-grown one.
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