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选取耐低温弱光性不同的2份黄瓜材料9507、9517及其配制的BC1、BC2、F1、F2等6个世代,进行低温弱光处理,每天光照处理7.5h,强度为30μmol/m2.s,约合2000lx,白天12℃,晚上8℃,共处理14d。运用主基因-多基因联合遗传模型方法研究耐低温性的遗传规律,并估算遗传参数。结果表明,耐低温性的遗传受2对加性主基因+加性-显性多基因控制,F1平均值略低于中亲值,主基因的遗传率为62.871%～79.310%,多基因的遗传率为3.448%～7.792%,主基因+多基因的遗传率为74.026%～82.759%,环境方差占表型方差的比率为17.241%～25.974%。即低温弱光条件下环境对耐低温性的遗传起很小作用,对于这个性状适于早代选择。
Two cucumber materials, 9507,9517 and BC1, BC2, F1 and F2, which were different in low temperature and poor light-fastness, were selected for six generations and were exposed to low temperature and low light for 7.5 hours each day with an intensity of 30μmol / m2.s , About 2000lx, day 12 ℃, 8 ℃ at night, a total of 14d. Study the genetic law of low temperature resistance by using the method of master gene - polygene combined with genetic model, and estimate the genetic parameters. The results showed that the inheritance of low temperature resistance was controlled by two pairs of additive major genes plus additive-dominance polygenes, the mean value of F1 was slightly lower than that of the intermediate value, and the heritability of the major genes was 62.871% -79.310% The heritability was 3.448% ~ 7.792%. The heritability of main gene + polygene was 74.026% ~ 82.759%. The ratio of environmental variance to phenotypic variance was 17.241% ~ 25.974%. That low temperature and low light conditions under the environment of low temperature resistance plays a small role for this trait suitable for early selection.