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在4Cr13不锈钢表面采用多弧离子镀沉积TiAlN薄膜,采用磁控溅射法和多弧离子镀在4Cr13表面分别沉积掺杂Cr和Cr、Ni的TiAlN薄膜,采用电化学工作站对其进行电化学腐蚀性能测试。结果表明:在1 mol/L的H_2SO_4溶液中,同时掺杂Cr、Ni的TiAlN薄膜的耐腐蚀性是TiAlN薄膜的4.1倍,是掺杂Cr的TiAlN薄膜的1.3倍;在3%的NaOH溶液中,同时掺杂Cr、Ni的TiAlN薄膜的耐腐蚀性是TiAlN薄膜的3倍,是掺杂Cr的TiAlN薄膜的2倍;在3.5%的Na Cl溶液中,同时掺杂Cr、Ni的TiAlN薄膜的耐腐蚀性是TiAlN薄膜的11.4倍,是掺杂Cr的TiAlN薄膜的1.3倍。
In the 4Cr13 stainless steel surface by multi-arc ion plating deposition TiAlN thin films, the use of magnetron sputtering and multi-arc ion plating deposited on the 4Cr13 surface were Cr-doped Cr and Ni-TiAlN thin films, the use of electrochemical workstation for electrochemical corrosion Performance Testing. The results show that the corrosion resistance of TiAlN thin films doped with Cr and Ni simultaneously is 4.1 times that of TiAlN thin films and 1.3 times that of Cr-doped TiAlN thin films in 1 mol / L H 2 SO 4 solution. In 3% NaOH solution , At the same time, the corrosion resistance of TiAlN films doped with Cr and Ni is three times that of TiAlN films and twice that of TiAlN films doped with Cr. In 3.5% NaCl solution, TiAlN films doped with Cr and Ni simultaneously The corrosion resistance of the film is 11.4 times that of the TiAlN film and 1.3 times that of the Cr-doped TiAlN film.