Pulsed reactive sputtering is a novel process used to deposit some compound films, which are not deposited by traditional D.C. reactive sputtering easily. In th
The sintering additives such as Al2O3 and/or Y2O3 were coated on the surfaces of Si3N4 particles via heterogeneousnucleation processing using a buffered pH solu
With rapid progressive application of TiO2 thin films,magnetron sputtering becomes a very interesting method to prepare such multi-functional thin films.This pa