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为了在氧化铝上制备 (100)定向织构的金刚石薄膜，必须先提高金刚石的成核密度。在微波 等离子体化学气相沉积（ MPCVD）系统中，采用低压成核的方法，在氧化铝陶瓷上沉积出高成核密 度的金刚石薄膜。扫描电镜显示其成核密度可达 108 cm－ 2。在此基础上，沉积出（ 100）织构的金 刚石薄膜。
In order to prepare a (100) oriented textured diamond film on alumina, the diamond nucleation density must first be increased. In the microwave plasma chemical vapor deposition (MPCVD) system, a low-pressure nucleation method was used to deposit diamond films with high nucleation density on alumina ceramics. Scanning electron microscopy showed its nucleation density of up to 108 cm-2. On this basis, (100) textured diamond films were deposited.