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[期刊论文] 作者：E.Wieers,L.M.Stals,J.P.Celis,,
来源：Journal of Materials Science & Technology 年份：2004
MoS2 coatings were prepared using an unbalanced bipolar pulsed DC (direct current) magnetron sputtering apparatus under different targets, cathode current densi...
[期刊论文] 作者：Jihui WANG,E.Wieers,L.M.Stals,,
来源：材料科学技术学报 年份：2004
MoSx coatings were prepared by bipolar-pulse DC unbalanced magnetron-sputtering system with the variation of coating thickness at different Ar pressures. The co...
[期刊论文] 作者：王吉会，HuaChen，E.Wieers，L.M.Stals,
来源：中国有色金属学报（英文版） 年份：2002
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[期刊论文] 作者：王吉会,夏扬,E.Wieers,L.M.Stals,J.P.Celis,,
来源：Transactions of Nonferrous Metals Society of China 年份：2005
MoS_2 coatings were prepared by unbalanced bipolar DC magnetron sputtering under different argon pressures and for different deposition times, and the structure...
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