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[期刊论文] 作者：Wang Zhao-Kui,Lin Kui-Xun,Lou Yan-Hui,Lin Xuan-Ying,Zhu Zu-Song,
来源：中国物理（英文版） 年份：2006
For a better understanding of the deposition mechanism of thin films in SiCl4 source gas, we have measured the spatial distributions of SiCln (n=0-2) radicals i...
,A new method of measuring the spatial distribution of depletion fraction of silane plasma by mass s
[期刊论文] 作者：Wang Zhao-Kui,Lin Kui-Xun,Lin Xuan-Ying,Qiu Gui-Ming,Zhu Zu-Song,
来源：中国物理（英文版） 年份：2005
A newly established movable sampling apparatus of mass spectrometer is used to measure the spatial distribution of depletion fraction of silane plasma. A straig...
,A Movable Mass Spectroscopy Sampling Apparatus for Measuring Spatial Distribution of Neutral Radica
[期刊论文] 作者：WANG Zhao-Kui,LIN Kui-Xun,LIN Xuan-Ying,QIU Gui-Ming,ZHU Zu-Song,
来源：中国物理快报（英文版） 年份：2005
A movable mass spectroscopy gas sampling apparatus has been established and a straight-line fit ofsilane depletion fraction f is proposed.The spatial density di...
[期刊论文] 作者：WANG Zhao-Kui,LIN Kui-Xun,LIN Xuan-Ying,LOU Yan-Hui,ZHU Zu-Song,
来源：中国物理快报（英文版） 年份：2006
Radicals produced by the plasma enhanced chemistry vapour deposition technique in SiCl4 plasma are identified by mass spectrometry using our newly proposed stra...
[期刊论文] 作者：Zhu Zu-Song,Lin Kui-Xun,Lin Xuan-Ying,Qiu Gui-Ming,Yu Yun-Peng,Luo Yi-Lin,
来源：中国物理（英文版） 年份：2006
The spatial distributions of the electron density and the mean electron energy of argon radio frequency (rf) glow discharge plasma in a plasma-enhanced chemical...
[期刊论文] 作者：HUANG Rui,LIN Xuan-Ying,YU Yun-Peng,LIN Kui-Xun,WEI Jun-Hong,YU Chu-Ying,WANG Zhao-Kui,
来源：中国物理快报（英文版） 年份：2004
We report the discovery of fast growth of polycrystalline silicon films under low temperature of 200-300 C from SiCl4/H2 mixture gases by plasma enhanced chemic...
,The reliability of measurements on electron energy distribution function in silane rf glow discharg
[期刊论文] 作者：Lin Kui-Xun(林揆训),Lin Xuan-Ying(林璇英),Chi Ling-Fei(池凌飞),Yu Chu-Ying(余楚迎),Yao Ruo-He(姚若河),Yu Yun-Peng(余云鹏,
来源：中国物理（英文版） 年份：2003
Electron energy distribution function (EEDF) is a key parameter of plasmas, which is directly proportional to the second derivative of the probe I-V characteris...
,Low-Temperature Growth of Polycrystalline silicon Films by SiCl4/H2 rf Plasma Enhanced Chemical Vap
[期刊论文] 作者：LIN Xuan-Ying(林璇英),HUANG Chuang-Jun(黄创君),LIN Kui-Xun(林揆训),YU Yun-Peng(余运鹏),YU Chu-Ying(余楚迎),CHI Ling-Fei,
来源：中国物理快报(英文版) 年份：2003
Polycrystalline silicon film was directly fabricated at 200℃ by the conventional plasma enhanced chemical vapour deposition method from SiCl4 with H2 dilution....
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