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[期刊论文] 作者:T.T.Sun,Z.G.Liu,H.C.Yu,M.B.Che,
来源:金属学报:英文版 年份:2005
Dry etching of silicon is an essential process step for the fabrication of Microelectromechancal system (MEMS) The AZ7220 positive photo-resist was used as the...
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