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[期刊论文] 作者：LIDong-ling,WENZhi-yu,SHANGZheng-guo,SHEYin,
来源：OptoelectronicsLetters 年份：2016
Thick SU8 microstructures with high aspect ratio and good side wall quality were fabricated by ultraviolet (UV) lithography, and the processing parameters were comprehensively studied. It proves that the adhesion of SU8 on silicon (Si) subs......
[期刊论文] 作者：LIDong-ling,FENGXiao-fei,WENZhi-yu,SHANGZheng-guo,SHEYin,
来源：OptoelectronicsLetters 年份：2016
Stress controllable silicon nitride (SiNx) films deposited by plasma enhanced chemical vapor deposition (PECVD) are reported. Low stress SiNx films were deposited in both high frequency (HF) mode and dual frequency (HF/LF) mode. By optimizi......
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