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An investigation on capabilities of polarization control for immersion lithography through simulatio
[期刊论文] 作者：GuobinYu,TingwenXing,HanminYao,
来源：ChineseOpticsLetters 年份：2005
The fundamental resolution limit and depth of focus of immersion lithography are described. The image contrasts for TE polarization, TM polarization, and unpolarized condition are explored in detail. There are complications associated with ......
[期刊论文] 作者：XianzhongChen,TingwenXing,ChunleiDu,HanminYao,
来源：ChineseOpticsLetters 年份：2005
Atom lithography suffers from serious practical limitations, which have limited the application of this technique in practice. Double deposition method, manipulation of atoms with a linear polarization gradient laser field and moving substr......
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