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[期刊论文] 作者:V. Cimalla,M. Baeumler,L. Kirs, 来源:材料科学与应用期刊(英文) 年份:2014
Thin AlOx films were grown on 4H-SiC by plasma-assisted atomic layer deposition (ALD) and plasma assisted electron-beam evaporation at 300°C. After deposit...
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