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[期刊论文] 作者：Haiwu ZHENG,Junjie ZHU,Zhuxi F,
来源：材料科学技术：英文版 年份：2005
3C-SiC films have been deposited on Si (111) substrates by the Iow-pressure vertical chemical vapor deposition (LPVCVD) with gas mixtures of SiH4, C3H8 and Ha....
[期刊论文] 作者：Haiwu ZHENG,Junjie ZHU,Zhuxi F,
来源：材料科学技术学报（英文版） 年份：2004
3C-SiC films have been deposited on Si (111) substrates by the Iow-pressure vertical chemical vapor deposition (LPVCVD) with gas mixtures of SiH4, C3H8 and Ha....
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