【摘 要】
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As widely used in the substrate etching,thin film growth,plasma propulsion,materials processing and semiconductor industry,inductively coupled plasma source (ICPs) excited by a single radio frequency
【机 构】
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School of Physics, Huazhong University of Science and Technology, Wuhan 430074, China
【出 处】
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13th Asia-Pacific Conference on Plasma Science and Technolog
论文部分内容阅读
As widely used in the substrate etching,thin film growth,plasma propulsion,materials processing and semiconductor industry,inductively coupled plasma source (ICPs) excited by a single radio frequency is an important low temperature plasma source.In the low pressure,the electron mean free paths are large relative to device size,this causes the electrons nonlocal and non-equilibrium,and there will be a list of important physical phenomenon such as collisionless heating,anomalous skin effect and negative power absorption.
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