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5. The plasma gas reaction factors influencing the deposition of TiO2 nanocrystallines film by atmosphe

The plasma gas reaction factors influencing the deposition of TiO2 nanocrystallines film by atmosphe

来源 :13th Asia-Pacific Conference on Plasma Science and Technolog | 被引量 : 0次 | 上传用户：sikongshan

【摘 要】

：

In this paper,we use atmospheric radio frequency (rf) plasma chemical vapor to prepare TiO2 nanocrystalline film and to study the plasma gas reaction factors influencing the film structure.

【作 者】

：

Linjun Dai Yu Xu A.A Siddig Eshrag Maoshui Wu Jianjun Shi Jing Zhang 

【机 构】

：

Department of Applied Physics, Donghua University, Shanghai 201620, China

【出 处】

：

13th Asia-Pacific Conference on Plasma Science and Technolog

【发表日期】

：

2016年10期

【关键词】

：

TiO2 nanoparticulate film atmospheric radio frequency plasma discharge plasma ga 

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　　In this paper,we use atmospheric radio frequency (rf) plasma chemical vapor to prepare TiO2 nanocrystalline film and to study the plasma gas reaction factors influencing the film structure.

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