Up-scaled deposition process of Teer-UDP850/4 has been established and used for massive production of CrTiAlN hard coatings in applications of anti-wear,cutting and forming tools.This deposition system uses four magnetrons that are arranged by unbalanced magnets to form a closed magnetic field enabling the system running in high current density.Cr,Ti and Al were used as the target materials,which were co-deposited with nitrogen to form multi-alloy nitride,nano-scale multilayer or superlattice hard coatings.In this experiment UDP450 was used to prepare the CrAlTiN film.Ti target and Al target were placed front to front in this equipment,and the other two Cr targets were also placed front to front.To study the effect of the content of rare earth element Y on the thickness of CrAlTiN film.Al targets with different Y contents were used to obtain CrAlTiNfilms with different Y contents deposited on Si(100) substrates.