Metal-Assisted Chemical Etching for High Aspect Ratio Hard X-ray Zone Plates

来源 :The 6th International Conference on Nanoscience and Technolo | 被引量 : 0次 | 上传用户:a369747001
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  High aspect ratio profiles are essential for simultaneously achieving high resolution and high diffraction efficiency in hard X-ray zone plates.[1] If only using lithography technology,the aspect ratio is limited by the bottom width broadening.By contrast,metal-assisted chemical etch(MaCE)would be a good alternative to fabricate high aspect ratio hard X-ray zone plates due to its small width broadening,low cost and simplicity.
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