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Mitigation of laser damage of fused silica has been proved to be an effective approach for preventing the further growth of damage site.
A novel high-density obscuration phenomenon during the HF etching and ion beam etching mitigation of
【摘 要】
：
Mitigation of laser damage of fused silica has been proved to be an effective approach for preventing the further growth of damage site.
【作 者】
：
【机 构】
：
ResearchCenterofLaserFusion,ChinaAcademyofEngineeringPhysics,Mianyang,Sichuan621900,ChinaSchoolofPhy
【出 处】
：
LIMIS 2016——The 4th International Symposium on Laser Interac
【发表日期】
：
2016年11期
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